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ULSI science and technology/1997, proceedings of the Sixth International Symposium on UltraLarge Scale Integration Science and Technology
Rev., 96, 28 (1954) [50] JC Irvin, Bell System Tech. J., 41, 387 (1962) [51] WR Thurber et al., J. Electrochem. ... D. Turnbull and H. Ehrenreich, Solid State Physics, Academic Press [88] SM Sze, Physics of Semiconductor Devices, ...
by Hisham Z. Massoud, H. Iwai, C. Claeys, Richard B. Fair
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Nanometer CMOS
[4] SM Sze (ed.), VLSI Technology, 2nd Edition, McGraw-Hill (1988). [5] CY Chang and SM Sze (eds.), ULSI Technology, McGraw-Hill 1996. [6] JD Plummer, MD Deal and PB Griffin, Silicon VLSI Technology: Fundamentals, Practice, and Modeling ...
by Frank Schwierz, Hei Wong, Juin J. Liou
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Handbook of VLSI Microlithography, 2nd Edition
Bowden, MJ, and Thompson, LF, Solid State Technology, 72 (May 1979) 3. Thompson, LF, Willson, CG, and Bowden, MJ, ... Sze, SM, VLSI Technology, McGraw-Hill, New York (1983) 6. McGillis, DA, “Lithography,”VLSI Technology, (SM Sze, ed.) ...
by John N Helbert
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| Rating: 4.60
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Fundamentals of Microfabrication, The Science of Miniaturization
C. W Pearce, "Crystal Growth and Wafer Preparation," in VLSI Technology, SM Sze, Ed. New York: McGraw- Hill, 1988. D. W Hess and KF Jensen, Eds., Microelectronics Processing: Chemical Engineering Aspects.
by Marc J. Madou
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MEMS, A Practical Guide to Design, Analysis, and Applications
SM Sze, "Classification and Terminology of Sensors," in Semiconductor Sensors ( SM Sze, ed.), John Wiley & Sons, NY (1994) 11. CY Chang and SM Sze, VLSI Technology, McGraw Hill (1996) 12. S. Sze, Physics of Semiconductor Devices, ...
by Jan G. Korvink, Oliver Paul
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| Rating: 4.00
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The VLSI handbook
SM Sze, Physics of Semiconductor Devices, 2nd ed., Wiley, New York, 1981. 7. LC Parrillo, RS Payne, RE Davis, GW Reutlinger, and RL Field, "Twin-Tub CMOS— A Technology for VLSI Circuits," IEEE International Electron Device Meeting, p.
by Wai-Kai Chen
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Deep-submicron CMOS ICs, from basics to ASICs
'Advanced Hi-Cmos Device Technology'. IEEE IEDM. pp. 534-537. Washington DC. 1981 [3] SM Sze. 'VLSI Technology', McGraw-Hill. New York, 1983 [3a] S. Wolf and RN Tauber. 'Silicon processing for the VLSI Era'. Volume 1. Process Technology ...
by Harry J. M. Veendrick
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| Rating: 5.00
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MEMS and NEMS, systems, devices, and structures
SM Sze, Semiconductor Devices - Physics and Technology, John Wiley, New York, 1985. 10. SM Sze, VLSI Technology, McGraw-Hill, New York, 1983. 11. KE Petersen, "Silicon as a mechanical material," IEEE Proceedings, pp. 420-457, 1982. 12.
by Sergey Edward Lyshevski
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| Rating: 4.50
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Germanium-Based Technologies, From Materials to Devices
[86] NIST Electron Inelastic-Mean-Free-Path Database 71 (Ver. 1.1), National Institute of Standards and Technology (2000). ... [101] SM Sze and JC Irvin, Solid-State Electron. 11 (1968) 599. [102] VM Gusev, MI Guseva, ES Ionova, ...
by Cor L. Claeys, Eddy Simoen
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Handbook of multilevel metallization for integrated circuits, materials, technology, and applications
RJ Schutz, Reactive Plasma Etching, VLSI Technology., 2nd Ed., SM Sze, Editor, 1988., Ch 5 17. RS Blewer, TJ Headley, and ME Tracy, in Proc. of Tungsten and other Refractory Metals for VLSI Applications III, ed.
by Syd R. Wilson, Clarence J. Tracy, John L. Freeman
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